Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

When giant blobs began appearing on city skylines around the world in the late 1980s and 1990s, it marked not an alien invasion but the impact of computers on the practice of building design. Thanks ...